We produce the magnesium hydroxide with the composition that is suitable for various usages.
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- PUREMAG®️FNM-HS
PRODUCTS
PUREMAG®️FNM-HS
High-purity Magnesium Hydroxide
Magnesium hydroxide having a purity of 99.9% or more
Features
Tateho developed the PUREMAG® FNM-HS high-purity magnesium hydroxide that is no less than 99.99 percent pure, by employing aspecial processing technology.
Because it contains hardly any impurities, it can be used for high-purity applications like electronic materials, phosphor raw materials, catalyst materials, and various additives, etc. as necessary in various wide-ranging usages.
1. High purity
This high-purity product contains the magnesium hydroxide at not less than 99.9 percent purity, with hardly any impurities.
It has the highest purity among commercially available magnesium hydroxide.
2. High dispersibility
The primary particle is monodispersed character particle of submicron size, with excellent dispersibility.
Powder Properties (Typical)
Median 50 % particle size (10-6m) | 0.75 |
---|---|
Specific surface area (103m2/kg) | 4.8 |
Particle size: Laser diffraction scattering method
Specific surface area: Gas adsorption method
*The properties are the typical values and not the guaranteed values.
Chemical Composition (Typical)
Mg(OH)2 (%) | 99.95 |
---|---|
Si (ppm) | 2 |
Al (ppm) | <1 |
Ca (ppm) | 5 |
Fe (ppm) | 1 |
Cr (ppm) | <1 |
Mn (ppm) | <1 |
Ni (ppm) | <1 |
V (ppm) | <1 |
B (ppm) | <1 |
Zr (ppm) | <1 |
Na (ppm) | 10 |
Cl (ppm) | 180 |
K (ppm) | <1 |
Zn (ppm) | <1 |
• Chemical composition: ICP (Inductively coupled plasma) Optical emission spectroscopy, Absorption Spectrophotometer
*The properties are the typical values and not the guaranteed values.
About PUREMAG® FNM-HS Particle Size
To facilitate handling, we process the granulation to secondary particle (A) of about ten microns before offering this product.
However, this product easily disperses to primary submicron particle (B) when stirring it into the solvent.
Therefore, this product can be used as a magnesium oxide particulate of high purity and high dispersion.
(A) Secondary particle
Particle Size Distribution (Typical)
Scanning Electron Microscope photograph
Measurement method: Laser diffraction scattering method [No Dispersion]
*The properties are the typical values and not the guaranteed values.
(B) Primary particle
Particle Size Distribution (Typical)
Scanning Electron Microscope photograph
Measurement method: Laser diffraction scattering method [Strong Dispersion]
*The properties are the typical values and not the guaranteed values.